E&R Engineering Corp. Forms E-Core System Alliance: Leading Glass Substrate into the Mass Production Era
E&R Engineering Corp. (8027.TWO) hosted an event on August 28, 2024, in Taipei, Taiwan, where they launched the "E-Core System." This initiative, a combination of "E&R" and "Glass Core" inspired by the sound of "Ecosystem," led to the establishment of the "Glass Substrate Supplier E-Core System Alliance." The alliance aims to combine expertise to promote comprehensive solutions, providing equipment and materials for next-generation advanced packaging with glass substrates to both domestic and international customers.
E&R's E-Core Alliance includes Manz AG, Scientech for wet etching, HYAWEI OPTRONICS for AOI optical inspection, Lincotec, STK Corp., Skytech, Group Up for sputtering and ABF lamination equipment, and other key component suppliers such as HIWIN, HIWIN MIKROSYSTEM, Keyence Taiwan, Mirle Group, ACE PILLAR CHYI DING), and Coherent.
E&R will continue leading the development of glass substrate technology in Taiwan, optimizing processes, and collaborating with more industry partners to achieve excellence.
E&R Engineering Corp. (8027.TWO) hosted an event on August 28, 2024, in Taipei, Taiwan, launching the "E-Core System" and establishing the "Glass Substrate Supplier E-Core System Alliance.
With the rapid
growth in demand for AI chips, high-frequency, and high-speed communication
devices, glass substrates in advanced packaging technologies are becoming
increasingly important. Compared to the widespread use of copper foil
substrates, glass substrates offer higher wiring density and better signal
performance. Additionally, glass provides extremely high flatness and can
withstand high temperatures and voltages, making it an ideal replacement for
traditional substrates.
The glass substrate process involves glass metallization, the subsequent ABF (Ajinomoto Build-up Film) lamination, and final substrate cutting. Key steps in glass metallization include TGV (Through-Glass Via), wet etching, AOI (Automated Optical Inspection), sputtering, and plating. These glass substrates measure 515×510mm, representing a new process in semiconductor and substrate manufacturing.
E&R (8027.TWO) possesses key self-developed
technology—the TGV (Through-Glass Via) in the Glass Core Flow.
E&R (8027.TWO) has mastered key TGV technology,
now achieving up to 8,000 vias per second for matrix layouts or 600 to 1,000
vias per second for random layouts.
SEMICON Taiwan 2024
• Location: Taipei Nangang Exhibition Center Hall 1
• Booth Information: 4F, #N0968
• Date: September 4-6, 2024
SEMICON Europa 2024
• Location: Messe München
• Booth Information: C2622
• Date: November 12-15, 2024