CL-1000M
6"/8"/12" Ring Wafer MW Plasma Cleaning
CL-1000M is a fully automatic plasma processing system for frame-form applications. Workpiece, e.g. diced wafer, BGA/CSP substrate, QFN lead-frame, mounted on the dicing fame can be processed by this system.
- Application
- Surface cleaning and activation prior to epoxy molding
- Anti-tackiness treatment
- Epoxy Molding Compound (EMC) thinning
- Plasma De-Flash: Residue removal of Epoxy Molding Compound(EMC) after molding
- Plasma De-Smear: Residue removal of Epoxy Molding Compound(EMC) after laser drilling
- Chip sidewall etching to enhance the die strength
- Surface cleaning and activation prior to epoxy molding
- Feature
- Microwave plasma source provides no ESD solution and isotropic etching process.
- Cooling chuck is optional available to prevent the dicing tape from damage.
- Rotating chuck enhances the process uniformity.
- System can be configured for 6”, 8” or 12” dicing frame.
- Automation, SECS/GEM, is available as an option.