• CL-1000M

CL-1000M

6"/8"/12" Ring Wafer MW Plasma Cleaning

CL-1000M is a fully automatic plasma processing system for frame-form applications. Workpiece, e.g. diced wafer, BGA/CSP substrate, QFN lead-frame, mounted on the dicing fame can be processed by this system.

  • Application
    • Surface cleaning and activation prior to epoxy molding
    • Anti-tackiness treatment
    • Epoxy Molding Compound (EMC) thinning
    • Plasma De-Flash: Residue removal of Epoxy Molding Compound(EMC) after molding
    • Plasma De-Smear: Residue removal of Epoxy Molding Compound(EMC) after laser drilling
    • Chip sidewall etching to enhance the die strength
    • Surface cleaning and activation prior to epoxy molding

    • Feature
      • Microwave plasma source provides no ESD solution and isotropic etching process.
      • Cooling chuck is optional available to prevent the dicing tape from damage.
      • Rotating chuck enhances the process uniformity.
      • System can be configured for 6”, 8” or 12” dicing frame.
      • Automation, SECS/GEM, is available as an option.


       Plasma Solution_CL1000M DM