• CL-1000M

CL-1000M

6"/8"/12" Ring Wafer MW Plasma Cleaning

CL-1000M is a fully automatic plasma processing system for frame-form applications. Workpiece, e.g. diced wafer, BGA/CSP substrate, QFN lead-frame, mounted on the dicing fame can be processed by this system.

  • Application
  • Surface cleaning and activation prior to epoxy molding
  • Anti-tackiness treatment
  • Epoxy Molding Compound (EMC) thinning
  • Plasma De-Flash: Residue removal of Epoxy Molding Compound(EMC) after molding
  • Plasma De-Smear: Residue removal of Epoxy Molding Compound(EMC) after laser drilling
  • Chip sidewall etching to enhance the die strength
  • Surface cleaning and activation prior to epoxy molding

  • Feature
  • Microwave plasma source provides no ESD solution and isotropic etching process.
  • Cooling chuck is optional available to prevent the dicing tape from damage.
  • Rotating chuck enhances the process uniformity.
  • System can be configured for 6”, 8” or 12” dicing frame.
  • Automation, SECS/GEM, is available as an option.


 Plasma Solution_CL1000M DM